Applications
- Thin film deposition
- Conductive and insulating films
- Sputter deposition research
Specifications and Features
- Deposit films on substrates up to 6 inches in diameter
- 4 cathode positions, with three 3" cathodes and one 2" cathodes
- An attached SRS CIS 200 RGA
- DC and RF power
- Loadlock, substrate heating up to 200 C and substrate bias
- Rapid pump down to low 10E-7 torr vacuum range
Documents and Links
All new processes must be reviewed and approved by ATAMI and Amorphyx using this form.
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