• Thin film deposition
  • Conductive and insulating films
  • Sputter deposition research

Specifications and Features

  • Deposit films on substrates up to 6 inches in diameter
  • 4 cathode positions, with three 3" cathodes and one 2" cathodes
  • An attached SRS CIS 200 RGA
  • DC and RF power
  • Loadlock, substrate heating up to 200 C and substrate bias
  • Rapid pump down to low 10E-7 torr vacuum range


Documents and Links

All new processes must be reviewed and approved by ATAMI and Amorphyx using this form.