Savannah has become the preferred ALD system for university researchers, worldwide. A wide variety or precursors are available, as well as a particle deposition attachment.
Applications
- Thin film depositions on irregular and flat surfaces in the nm range
- Depositing films on particles
- Supplier supported standard recipes for a wide variety of films
Specifications and Features
- Deposit on flat substrates up to 200mm in diameter
- Maximum substrate temp - 350 C
- Deposition uniformity < 1% (Al2O3)
- UP to 6 lines available for precursors
- Particle coating attachment
- Ozone generator
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