Photolithography for a R&D in a desktop platform. This system enables researchers to print features on substrates as large as 200mm, with feature sizes below 5 microns. A variety of UV sources, resists and mask options are available.
Applications
- Patterning on Si wafers using SU8 or resist.
- Patterning on other flat surfaces such as metal shims.
Specifications and Features
- Pattern on substrates up to 6" diameter wafers or even 6"x6" square substrates.
- Mask sizes from 2"x2" to 7"x7".
- Capable of resolution of 1 micron structures with overlay accuracy of 0.2 microns.
- Capable of handling sources ranging form 200 to 2000 watts, at 220 to 436 nm. Areas from 1" to 6" may be uniformly exposed.
- Dual-sensor, optical feedback to provides exposure intensity within +/- 2% of the desired intensity.
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