Savannah has become the preferred ALD system for university researchers, worldwide.   A wide variety or precursors are available, as well as a particle deposition attachment.


  • Thin film depositions on irregular and flat surfaces in the nm range
  • Depositing films on particles
  • Supplier supported standard recipes for a wide variety of films

Specifications and Features

  • Deposit on flat substrates up to 200mm in diameter
  • Maximum substrate temp - 350 C
  • Deposition uniformity < 1% (Al2O3)
  • UP to 6 lines available for precursors
  • Particle coating attachment
  • Ozone generator


Documents and Links