Title | An analytical model of the diffusive scattering of low-energy electrons in electron-beam resists |
Publication Type | Journal Article |
Year of Publication | 1999 |
Authors | Paul, BK |
Journal | Microelectronic engineering |
Volume | 49 |
Pagination | 233–244 |
Abstract | An analytical model is developed for predicting the electron penetration profile created by the low-energy exposure of electron-beam sensitive resists. The model uses a multiple forward-scattering scheme adapted by the modified age diffusion approximation to the Boltzmann transport equation to produce a computationally efficient model. Model validation is performed using the literature and experimental results. The model is used to predict low-energy electron penetration profiles formed by a micro-mechanical prototyping device. |